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'I-V Characteristic and Crystal Structural Of a-As/c-Si Heterojunctions

Baghdad Science Journal

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Title 'I-V Characteristic and Crystal Structural Of a-As/c-Si Heterojunctions
 
Creator Journal, Baghdad Science
 
Description In this research the a-As flims have been prepared by thermal evaporation with thickness 250 nm and rata of deposition r_d(1.04nm/sec) as function to annealing temperature (373 and 473K), from XRD analysis we can see that the degree of crystalline increase with T_a, and I-V characteristic for dark and illumination shows that forward bias current varieties approximately exponentially with voltage bias. Also we found that the quality factor and saturation current dependence on annealing temperatures.
 
Publisher College of Science for Women - University of Baghdad
 
Date 2014-06-01
 
Type info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Peer-reviewed Article
 
Format application/pdf
 
Identifier http://bsj.uobaghdad.edu.iq/index.php/BSJ/article/view/2673
 
Source مجلة بغداد للعلوم; مجلد 11 عدد 2 (2014): issue 2 عدد خاص بالمؤتمر النسوي الثاني; 621-624
Baghdad Science Journal; Vol 11 No 2 (2014): issue 2 عدد خاص بالمؤتمر النسوي الثاني; 621-624
2411-7986
2078-8665
 
Language eng
 
Relation http://bsj.uobaghdad.edu.iq/index.php/BSJ/article/view/2673/2604
 
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